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In situ measurements of thickness changes and mechanical stress upon gasochromic switching of thin MoOx films 

Okumu, J.; Koerfer, F.; Salinga, C.; Wuttig, M. (American Institute of Physics (AIP), 2004)
Thin films of MoOx coated with platinum as a catalyst were prepared by dc magnetron sputtering from a molybdenum target in an oxygen and argon atmosphere. The films were colored and bleached by exposure to diluted hydrogen ...
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Optical and Electrical Properties of Zinc Oxide Doped with Aluminium (ZnO:Al) thin Films Prepared by Reactive Evaporation Method 

Njoroge, W. K.; Mugah, Charles Onyango; Okumu, J. (2012-11)
Transparent conducting ZnO:Al thin films were prepared by reactive evaporation method in the Physics laboratory using An Edward Auto 306 RF/DC Magnetron deposition chamber. This was done at a temperature of 500K, current ...
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Excitation of the Lowest Autoionizing Level of Caesium Atoms by Positron Impact 

Munywoki, A. W.; Okumu, J.; Singh, C. S (African Journal of Pure & Applied science (AJPAS), 2021)
We have obtained differential and integral cross sections for the excitation of caesium atom to the lowest autoionizing level by positron impact using the distorted wave approximation. We have also done calculations for ...
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Optical and Electrical Properties of Pbs Thin Films Grown by Chemically Bath Deposition [CBD] at Different Lead Concentrations 

Mosiori, Cliff Orori; Njoroge, W. N.; Okumu, J. (Academicians Research Center, 2014)
Lead sulphide [PbS] thin films were deposited on glass slide substrates using the chemical bath deposition [CBD] technique at room temperature for 120 minutes. Optical properties of the thin films were measured by ...
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Gasochromic Switching of Reactively Sputtered Molybdenumoxide Films: A Correlation between Film Properties and Deposition Pressure. 

Okumu, J.; Koerfer, F.; Salinga, C.; Pedersen, T. P.; Wuttig, M. (Elsevier B.V., 2006)
Molybdenumoxide (MoOx) thin films can change their optical properties upon exposure to hydrogen. Since the film properties strongly depend on process parameters we have studied how the films are affected by the total ...
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Excitation Cross-section Evaluation for the Lowest Auto-ionizing State of Potassium 

Jobunga, E.; Okumu, J.; Singh, C. S. (The African Review of Physics, 2012)
The accuracy and reliability of any theoretical scattering model relies on the wave functions used and the energy of the projectile. Perturbation methods are known to be accurate at intermediate and high energies of the ...
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Influence of deposition parameters on the optical properties of thin tungsten oxide films prepared by reactive Dc magnetron sputtering 

Wangati, C. K.; Njoroge, W.K.; Okumu, J. (2008-11)
Tungsten oxide thin films are the most investigated because of their possible application in electrochromic devices. Studies have shown that the film properties depend on deposition conditions and preparation techniques. ...
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A distorted wave method applied to study the 23S and 23P excitation of helium atom by electron impact 

Linturi, J. M.; Okumu, J.; Singh, C. S. (2012-10-23)
Differential and total cross sections for 11S-23S and 11S-23P excitation of helium atom has been calculated using distorted wave method. The distortion potential is taken as the static potential of the helium atom in the ...
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Design and fabrication of a simple four point probe system for electrical characterization of thin films 

Agumba, J.O.; Karimi, P.M.; Okumu, J.; Njoroge, W.K. (2011-07)
The electrical characteristics of semiconductor thin films are of great practical interest in microelectronics industry hence the need to measure these parameters in a cheaper and faster manner possible. In this study, ...
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Calculation of linear and non-linear optical properties of amorphous Silicon 

Okumu, J.; Morgan, G.J. (Faculty of Science Kenyatta University, 2001)
We have used the random phase model for the electronic wave functions to calculate the imaginary part of the dielectric function 82 (m) and the magnitude of the third harmonic generation, 11'3(OJ ~ using a model structure ...

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Okumu, J. (9)
Koerfer, F. (2)Njoroge, W.K. (2)Salinga, C. (2)Singh, C. S. (2)Wuttig, M. (2)Agumba, J.O. (1)Jobunga, E. (1)Karimi, P.M. (1)Linturi, J. M. (1)... View MoreSubjectoptical properties (2)Sputtering (2)atomic collision (1)autoionizing state (1)Chemical Bath Deposition process (1)deposition conditions (1)Differential cross section (1)disordered systems (1)distorted wave method (1)Edward Auto 306 RF/DC Magnetron Deposition Chamber (1)... View MoreDate Issued2020 - 2021 (1)2010 - 2019 (5)2001 - 2009 (4)

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